The Design Museum has announced a call for entries for its 2017 Designers in Residence programme. Following the theme Support, Designers in Residence offers four creatives the chance to work in studios at the museum in Kensington, London.
The call for entries is open now and applications will be accepted until 9am, on Monday 6 February 2017.
The Designers in Residence programme was established ten years ago to celebrate and support new and emerging design talent, offering them the opportunity to develop a project in collaboration with the Design Museum and exhibit their work to the public. Each resident is offered a bursary, commissioning budget and the production costs required to realise their new commission. Past designers who have completed the residency include Asif Khan, Bethan Laura Wood, Giles Miller, Yuri Suzuki, Sarah van Gameren and Adrian Westaway.
The Designers in Residence curator, Margaret Cubbage comments:
“For Designers in Residence 2017 the Design Museum invites designers and architects to respond to the theme Support. The notion of support has underpinned the whole residency since its inception, however for the first time in the programme’s history, the museum will provide four designers with a designated studio space. As before, this opportunity will provide designers the time and space to focus and develop a project independently, with the help of the Design Museum and its network of established practitioners. Designers in Residence will offer an environment for the advancement of fresh ideas and a fertile ground for experimentation.
“The museum aims to empower the selected designers, creating an infrastructure that balances support with self-sufficiency, enabling them to thrive in their own creative practices. Support within design, could be structural, spatial or social, from co-design, to service design, support is about a thorough understanding of the audience or user. The multi-disciplinary platform will unite designers by exploring topics of shared interest that relate to the theme.”
Information on how to apply can be found here